The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 24, 2010
Filed:
Mar. 01, 2007
Ramidin Izair Kamidi, Eindhoven, NL;
Henrikus Herman Marie Cox, Eindhoven, NL;
Ronald Casper Kunst, Eindhoven, NL;
Youssef Karel Maria DE Vos, Lile, BE;
Ramidin Izair Kamidi, Eindhoven, NL;
Henrikus Herman Marie Cox, Eindhoven, NL;
Ronald Casper Kunst, Eindhoven, NL;
Youssef Karel Maria De Vos, Lile, BE;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A stage system for a lithographic apparatus includes a stage, an over-determined number of actuators to act on the stage, at least two sensors to measure a position dependent parameter of the stage and to provide a respective sensor signal. The at least two sensors are arranged to measure the respective position dependent parameters in a same degree of freedom. A controller is provided to provide a controller output signal to at least one of the actuators in response to a setpoint and the position dependent parameter as measured by at least one of the sensors. A further controller is provided with the position dependent parameters measured by the sensors. The further controller is configured to determine a difference between the position dependent parameters from the sensors and to provide a further controller output signal to at least one of the actuators in response to the determined difference.