The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 24, 2010
Filed:
Jun. 20, 2006
Applicants:
Cheol-woo Park, Suwon-si, KR;
Byoung-moon Yoon, Suwon-si, KR;
Yong-sun Ko, Suwon-si, KR;
Kyung-hyun Kim, Seoul, KR;
Kwang-wook Lee, Seongnam-si, KR;
Inventors:
Cheol-Woo Park, Suwon-si, KR;
Byoung-Moon Yoon, Suwon-si, KR;
Yong-Sun Ko, Suwon-si, KR;
Kyung-Hyun Kim, Seoul, KR;
Kwang-Wook Lee, Seongnam-si, KR;
Assignee:
Samsung Electronics Co., Ltd., Gyeonggi-do, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/302 (2006.01);
U.S. Cl.
CPC ...
Abstract
A semiconductor structure may be formed by a wet etching process using an etchant containing water. The semiconductor structure may include a plurality of patterns having an increased or higher aspect ratio and may be arranged closer to one another. A dry cleaning process may be performed using hydrogen fluoride gas on the semiconductor structure.