The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 24, 2010
Filed:
Mar. 11, 2005
Ling Chen, Sunnyvale, CA (US);
Vincent Ku, San Jose, CA (US);
Dien-yeh Wu, San Jose, CA (US);
Hua Chung, San Jose, CA (US);
Alan Ouye, San Mateo, CA (US);
Norman Nakashima, Sunnyvale, CA (US);
Ling Chen, Sunnyvale, CA (US);
Vincent Ku, San Jose, CA (US);
Dien-Yeh Wu, San Jose, CA (US);
Hua Chung, San Jose, CA (US);
Alan Ouye, San Mateo, CA (US);
Norman Nakashima, Sunnyvale, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
Apparatus and method for forming thin layers on a substrate are provided. A processing chamber has a gas delivery assembly that comprises a lid with a cap portion and a covering member that together define an expanding channel at a central portion of the lid, the covering member having a tapered bottom surface extending from the expanding channel to a peripheral portion of the covering member. Gas conduits are coupled to the expanding channel and positioned at an angle from a center of the expanding channel to form a circular gas flow through the expanding channel, The bottom surface of the chamber lid is shaped and sized to substantially cover the substrate receiving surface. One or more valves are coupled to the passageway, and one or more gas sources are coupled to each valve. A choke is disposed on the chamber lid adjacent a perimeter of the tapered bottom surface.