The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 17, 2010
Filed:
Jul. 28, 2005
Wen Chun Huang, Tainan Country, TW;
Ru-gun Liu, Hsinchu, TW;
Chih-ming Lai, Hsinchu, TW;
Chen Kun Tsai, Hsinchu, TW;
Chien Wen Lai, Hsinchu, TW;
Cherng-shyan Tsay, Hsinchu, TW;
Cheng Cheng Kuo, Hsinchu, TW;
Yao-ching Ku, Hsin-chu, TW;
Wen Chun Huang, Tainan Country, TW;
Ru-Gun Liu, Hsinchu, TW;
Chih-Ming Lai, Hsinchu, TW;
Chen Kun Tsai, Hsinchu, TW;
Chien Wen Lai, Hsinchu, TW;
Cherng-Shyan Tsay, Hsinchu, TW;
Cheng Cheng Kuo, Hsinchu, TW;
Yao-Ching Ku, Hsin-chu, TW;
Taiwan Semiconductor Manufacturing Company, Ltd., Hsin-Chu, TW;
Abstract
An optimized optical proximity correction modeling method comprises receiving a selection of a regression method, displaying regression parameters, receiving values for the displayed regression parameters, receiving a selection of an optimization method, displaying optimization parameters, receiving values for the displayed optimization parameters, and generating an optimized optical proximity correction output.