The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 17, 2010

Filed:

Sep. 29, 2008
Applicants:

Jaehyun Kim, Fremont, CA (US);

Arthur H. Sato, San Jose, CA (US);

Keith Comendant, Fremont, CA (US);

Qing Liu, Austin, TX (US);

Feiyang Wu, San Francisco, CA (US);

Inventors:

Jaehyun Kim, Fremont, CA (US);

Arthur H. Sato, San Jose, CA (US);

Keith Comendant, Fremont, CA (US);

Qing Liu, Austin, TX (US);

Feiyang Wu, San Francisco, CA (US);

Assignee:

Lam Research Corporation, Fremont, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01R 27/26 (2006.01);
U.S. Cl.
CPC ...
Abstract

Characterizing dielectric properties of a part includes placing a full-sized part within a dielectric property measurement apparatus. In one embodiment, the full-sized part is a dielectric part of a plasma processing system. The dielectric property measurement apparatus is operated to determine a dielectric constant value of the full-sized part and a loss tangent value of the full-sized part. The determined dielectric constant and loss tangent values are affixed to the full-sized part.


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