The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 17, 2010

Filed:

Jul. 30, 2007
Applicants:

Hisashi Okuchi, Yokohama, JP;

Hiroyasu Iimori, Yokohama, JP;

Mami Saito, Yokohama, JP;

Yoshihiro Ogawa, Yokohama, JP;

Hiroshi Tomita, Yokohama, JP;

Soichi Nadahara, Yokohama, JP;

Inventors:

Hisashi Okuchi, Yokohama, JP;

Hiroyasu Iimori, Yokohama, JP;

Mami Saito, Yokohama, JP;

Yoshihiro Ogawa, Yokohama, JP;

Hiroshi Tomita, Yokohama, JP;

Soichi Nadahara, Yokohama, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/302 (2006.01); H01L 21/461 (2006.01);
U.S. Cl.
CPC ...
Abstract

An etching apparatus includes a chamber containing an etching solution including first and second components and water, a concentration of the water in the etching solution is at a specified level or lower; a circulation path circulating the etching solution; a concentration controller sampling the etching liquid from the circulation path and controls concentrations of the etching solution respectively; and a refilling chemical liquid feeder feeding a refilling chemical liquid including the first component having a concentration higher than the first component in the etching solution.


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