The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 17, 2010
Filed:
Oct. 31, 2006
Kenric T. Choi, Santa Clara, CA (US);
Pravin K. Narwankar, Sunnyvale, CA (US);
Shreyas S. Kher, Campbell, CA (US);
Son T. Nguyen, San Jose, CA (US);
Paul Deaton, San Jose, CA (US);
Khai Ngo, Cedar Park, TX (US);
Paul Chhabra, Austin, TX (US);
Alan H. Ouye, San Mateo, CA (US);
Dien-yeh (Daniel) Wu, San Jose, CA (US);
Kenric T. Choi, Santa Clara, CA (US);
Pravin K. Narwankar, Sunnyvale, CA (US);
Shreyas S. Kher, Campbell, CA (US);
Son T. Nguyen, San Jose, CA (US);
Paul Deaton, San Jose, CA (US);
Khai Ngo, Cedar Park, TX (US);
Paul Chhabra, Austin, TX (US);
Alan H. Ouye, San Mateo, CA (US);
Dien-Yeh (Daniel) Wu, San Jose, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
A method and apparatus for providing a precursor to a process chamber is described. The apparatus comprises an ampoule capable of receiving either a liquid precursor source material or a solid precursor source material. The ampoule is capable of delivering either a liquid precursor material to a vaporizer coupled to the process chamber, or a vaporized or gaseous precursor material to the process chamber. The ampoule also includes a continuous level sensor to accurately monitor the level of precursor source material within the ampoule.