The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 10, 2010
Filed:
Apr. 02, 2008
Claudius Feger, Poughkeepsie, NY (US);
Nancy C. Labianca, Yalesville, CT (US);
Steven E. Steen, Peekskill, NY (US);
Claudius Feger, Poughkeepsie, NY (US);
Nancy C. LaBianca, Yalesville, CT (US);
Steven E. Steen, Peekskill, NY (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
A process and system for determining alignment data for partially obscured features on wafers or chips when a wafer or chip is substantially coated by an over bump applied material, e.g. a resin or film, and using that data to align the wafers or chips for subsequent operations such as dicing or joining. Position data for alignment is produced by identifying a location of an at least partially obscured feature by varying the depth of focus upon a work piece to determine an SNR approximating a maximum value from an image captured by optical scanning. An SNR above a threshold value can be employed.