The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 7772654 B1

PDF
Full Text
Expired
Date of Patent:
Aug. 10, 2010

Filed:

Mar. 28, 2006
Applicants:

Yoo-cheol Shin, Gyeonggi-do, KR;

Jung-dal Choi, Gyeonggi-do, KR;

Inventors:

Yoo-Cheol Shin, Gyeonggi-do, KR;

Jung-Dal Choi, Gyeonggi-do, KR;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 27/088 (2006.01);
U.S. Cl.
CPC ...
Abstract

Nonvolatile memory devices and methods of fabricating the same are provided. A semiconductor substrate is provided having a cell field region and a high-voltage field region. Device isolation films are provided on the substrate. The device isolation films define active regions of the substrate. A cell gate-insulation film and a cell gate-conductive film are provided on the cell field region of the substrate including the device isolation films. A high-voltage gate-insulation film and a high-voltage gate-conductive film are provided on the high-voltage field region of the substrate including the device isolation films. The device isolation film on the high-voltage field region of the substrate is at least partially recessed to provide a groove therein.


Find Patent Forward Citations

Shin, Yoo-Cheol. (2010). Methods of fabricating nonvolatile memory devices (U.S. Patent No. 7772654). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7772654

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