The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 10, 2010
Filed:
Mar. 11, 2009
Hiroto Yoshii, Utsunomiya, JP;
Kenichiro Mori, Utsunomiya, JP;
Hiroto Yoshii, Utsunomiya, JP;
Kenichiro Mori, Utsunomiya, JP;
Canon Kabushiki Kaisha, , JP;
Abstract
An exposure method for exposing a pattern of a reticle onto a plate using a light from a light source and an optical system includes the steps of obtaining a relationship between an exposure parameter that determines a mode to expose a plate, and an electrical characteristic of a device derived from the device, determining whether the device obtained from the set exposure parameter has a predetermined electrical characteristic, and adjusting the set exposure parameter based on the relationship between the exposure parameter and the electrical characteristic, if the determining step determines that the device does not have the predetermined electrical characteristic.