The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 10, 2010
Filed:
May. 28, 2008
Applicants:
Fenghong Zhang, Sunnyvale, CA (US);
Xinyu Zhang, Palo Alto, CA (US);
Jian Xu, San Jose, CA (US);
Inventors:
Assignee:
Promos Technologies Pte. Ltd., Singapore, SG;
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G03F 1/00 (2006.01); G03C 5/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
In photolithographic exposure, a feature () of an optical mask is projected onto a dark area (). The light intensity inside the dark area is reduced by providing a non-printable clear cutout () inside the feature. The optical mask has the same optical pathlength outside the feature () adjacent to the entire outer boundary of the feature as at the cutout, the optical pathlength being measured along the optical mask's thickness.