The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 03, 2010
Filed:
Mar. 22, 2007
Applicants:
Katsuyuki Moriya, Azumino, JP;
Toshimitsu Hirai, Chino, JP;
Inventors:
Katsuyuki Moriya, Azumino, JP;
Toshimitsu Hirai, Chino, JP;
Assignee:
Seiko Epson Corporation, , JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
A method for forming a film pattern by disposing a functional liquid in a pattern forming region partitioned by a bank includes: disposing a first bank forming material to a substrate so as to form a first bank layer; and forming a second bank layer on the first bank layer, wherein the first bank forming material is an organic material while the second bank layer is made of a fluorine resin material covering the first bank layer.
Moriya, Katsuyuki. (2010). Methods for forming film patterns by disposing a liquid within a plural-level partition structure (U.S. Patent No. 7767504). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7767504
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile