The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 03, 2010

Filed:

Apr. 19, 2005
Applicants:

Shinichi Kohno, Kawasaki, JP;

Takeshi Iwai, Kawasaki, JP;

Ryotaro Hayashi, Kwasaki, JP;

Inventors:

Shinichi Kohno, Kawasaki, JP;

Takeshi Iwai, Kawasaki, JP;

Ryotaro Hayashi, Kwasaki, JP;

Assignee:

Tokyo Ohka Kogyo Co., Ltd., Kawasaki-shi, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/004 (2006.01); G03F 7/30 (2006.01);
U.S. Cl.
CPC ...
Abstract

The present invention is a positive type resist composition comprising a resin component (A) for use in a resist, having alkali solubility which increases under the action of an acid, an acid generator component (B) which generates an acid upon being exposed, and an organic solvent which dissolves the resin component (A) and the acid generator component (B), wherein the resin component (A) contains the resin component (A1) for use in a resist having alkali solubility which increases under the action of an acid having the following structural units (a1), (a2) and (a3): (in formula (1), R represents a hydrogen atom or a lower alkyl group, Rrepresents acid-dissociable, dissolution-inhibiting groups consisting of chain tertiary alkyl groups),


Find Patent Forward Citations

Kohno, Shinichi. (2010). Positive type resist composition, process for forming resist pattern, and process for performing ion implantation (U.S. Patent No. 7767377). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7767377

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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