The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 27, 2010
Filed:
Aug. 30, 2007
Applicant:
Fumio Hosokawa, Tokyo, JP;
Inventor:
Fumio Hosokawa, Tokyo, JP;
Assignee:
JEOL Ltd., Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G21K 1/08 (2006.01);
U.S. Cl.
CPC ...
Abstract
There is disclosed an electron beam system in which the third-order aberration Swith two-fold symmetry is corrected. If a Ccorrector is operated, parasitic aberration S(third-order aberration Swith two-fold symmetry) is produced. A corrective third-order aberration S' with two-fold symmetry that cancels out the parasitic aberration Sis produced within a multipole element to correct the parasitic aberration S. The electron beam is tilted relative to the optical axis within the multipole element producing a hexapole field. The corrective third-order aberration S′ with two-fold symmetry is introduced in each electron forming the tilted electron beam.