The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 27, 2010
Filed:
Feb. 18, 2005
Applicants:
Ji-sang Yahng, Seoul, KR;
Young-wook Park, Gyeonggi-do, KR;
Jae-jong Han, Seoul, KR;
Jum-soo Chang, Gyeonggi-do, KR;
Inventors:
Ji-Sang Yahng, Seoul, KR;
Young-Wook Park, Gyeonggi-do, KR;
Jae-Jong Han, Seoul, KR;
Jum-Soo Chang, Gyeonggi-do, KR;
Assignee:
Samsung Electronics Co., Ltd., Gyeonggi-Do, KR;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/31 (2006.01); H01L 21/677 (2006.01); C23C 16/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
A layer is formed on a semiconductor wafer in an apparatus having a processing chamber, a transferring chamber, and a wafer boat. The boat having the semiconductor wafer thereon is rotated in the transferring chamber. While the boat is rotated, the boat is transferred between the transferring chamber and the processing chamber and a reaction gas is provided to the processing chamber to form the layer on the wafer.