The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 20, 2010
Filed:
Mar. 27, 2008
Markus Mengel, Heidenheim, DE;
Ulrich Wegmann, Koenigsbronn, DE;
Albrecht Ehrmann, Aalen-Ebnat, DE;
Wolfgang Emer, Aalen, DE;
Reiner Clement, Amstetten, DE;
Ludo Mathijssen, Schwaebisch Gmuend, DE;
Markus Mengel, Heidenheim, DE;
Ulrich Wegmann, Koenigsbronn, DE;
Albrecht Ehrmann, Aalen-Ebnat, DE;
Wolfgang Emer, Aalen, DE;
Reiner Clement, Amstetten, DE;
Ludo Mathijssen, Schwaebisch Gmuend, DE;
Carl Zeiss SMT AG, Oberkochen, DE;
Abstract
A measuring system for the optical measurement of an optical imaging system, which is provided to image a pattern arranged in an object surface of the imaging system in an image surface of the imaging system, comprises an object-side structure carrier having an object-side measuring structure, to be arranged on the object side of the imaging system; an image-side structure carrier having an image-side measuring structure, to be arranged on the image side of the imaging system; the object-side measuring structure and the image-side measuring structure being matched to each other in such a way that, when the object-side measuring structure is imaged onto the image-side measuring structure with the aid of the imaging system, a superposition pattern is produced; and a detector for the locally resolving acquisition of the superposition pattern. The imaging system is designed as an immersion system for imaging with the aid of an immersion liquid. A structure carrier to be arranged in the region of the immersion liquid is assigned a protective system in order to increase the resistance of the measuring structure to degradation caused by the immersion liquid. A measurement of immersion systems under immersion conditions is thereby possible without detrimental influence of the immersion liquid on the measuring accuracy.