The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 20, 2010

Filed:

Apr. 10, 2008
Applicant:

Chris P Grudzien, Haverhill, MA (US);

Inventor:

Chris P Grudzien, Haverhill, MA (US);

Assignee:

MKS Instruments, Inc., Andover, MA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01L 13/02 (2006.01); G01L 9/12 (2006.01);
U.S. Cl.
CPC ...
Abstract

A capacitance manometer comprises: a flexible diaphragm including a first electrode structure; an electrode structure including second and third spaced-apart electrode structures secured relative to the diaphragm so as to establish a capacitance between the first electrode structure and the second electrode structure and a capacitance between the first electrode structure and the third spaced-apart electrode structure, wherein the capacitances between the first electrode structure and each of the second and third electrode structures change with changes in differential pressure placed on opposite sides of the flexible diaphragm; and a thick film dielectric material disposed between the first electrode and each of the second and third spaced-apart electrode structures so as to increase the gain in capacitance of the manometer without decreasing the distance between the first electrode structure and each of the second and third electrode structures and without increasing the stroke of the flexible diaphragm, while preventing the first electrode structure from shorting with either the second or third electrode structure in response to over pressurization conditions.


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