The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 13, 2010
Filed:
Dec. 15, 2004
Applicants:
Karl-heinz Schuster, Konigsbronn, DE;
Wilfried Clauss, Tuebingen, DE;
Inventors:
Karl-Heinz Schuster, Konigsbronn, DE;
Wilfried Clauss, Tuebingen, DE;
Assignee:
Carl Zeiss SMT AG, Oberkochen, DE;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 3/00 (2006.01); G02B 9/00 (2006.01); G03B 27/42 (2006.01);
U.S. Cl.
CPC ...
Abstract
Very high aperture microlithography projection objectives operating at the wavelengths of 248 nm, 193 nm and also 157 nm, suitable for optical immersion or near-field operation with aperture values that can exceed 1.4 are made feasible with crystalline lenses and crystalline end plates P of NaCl, KCl, KI, RbI, CsI, and MgO, YAG with refractive indices up to and above 2.0. These crystalline lenses and end plates are placed between the system aperture stop AS and the wafer W, preferably as the last lenses on the image side of the objective.