The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 13, 2010

Filed:

Oct. 31, 2006
Applicants:

Michael Kishinevsky, North Andover, MA (US);

Ilya Bystryak, Salem, MA (US);

Alan R. Millner, Lexington, MA (US);

Inventors:

Michael Kishinevsky, North Andover, MA (US);

Ilya Bystryak, Salem, MA (US);

Alan R. Millner, Lexington, MA (US);

Assignee:

MKS Instruments, Inc., Andover, MA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G05F 1/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method and apparatus for controlling a power supply to prevent instabilities due to dynamic loads in RF plasma processing systems, operating at frequencies of from 1 MHz and up 1 MHz and above. The apparatus includes a power source, a power converter receiving power from the source, the power converter providing a constant output power controlled by varying at least one of input voltage or switching frequency, and an RF generator receiving constant power from the power converter.


Find Patent Forward Citations

Quick Actions:

Kishinevsky, Michael. (2010). Method and apparatus for preventing instabilities in radio-frequency plasma processing (U.S. Patent No. 7755300). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7755300

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Loading…