The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 13, 2010

Filed:

Feb. 12, 2008
Applicants:

Kenichi Kamimura, Hitachi, JP;

Satoshi Kawada, Tokyo, JP;

Kouji Tsuchiya, Tokyo, JP;

Inventors:

Kenichi Kamimura, Hitachi, JP;

Satoshi Kawada, Tokyo, JP;

Kouji Tsuchiya, Tokyo, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B01D 59/44 (2006.01);
U.S. Cl.
CPC ...
Abstract

The invention provides a method for analyzing minute amounts of Pd, Rh and Ru with high accuracy by a high-frequency plasma mass spectroscope. The method comprises (1) a step of pretreating a sample by an alkali fusion method using a sodium compound; and (2) a step of analyzing the pretreated sample using a high-frequency plasma mass spectroscope; wherein, in step (2), the distance between a sampling cone and a skimmer cone is adjusted such that the concentration ofArCu which interferes with Pd, the concentrations ofArCu andArArNa which interfere with Rh, and the concentrations ofArCu andArArNa which interfere with Ru are all equal to or less than 0.05 ppb.


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