The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 13, 2010
Filed:
Jul. 30, 2008
Kirby Floyd, San Jose, CA (US);
Adrian Q. Montgomery, San Jose, CA (US);
Jennifer Gonzales, Riverside, CA (US);
Won Bang, Santa Clara, CA (US);
Rong Pan, San Jose, CA (US);
Amna Mohammed, Sunnyvale, CA (US);
Yen-kun Victor Wang, Fremont, CA (US);
Kirby Floyd, San Jose, CA (US);
Adrian Q. Montgomery, San Jose, CA (US);
Jennifer Gonzales, Riverside, CA (US);
Won Bang, Santa Clara, CA (US);
Rong Pan, San Jose, CA (US);
Amna Mohammed, Sunnyvale, CA (US);
Yen-Kun Victor Wang, Fremont, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
A method of adjusting a spacing between a gas distribution member and a substrate support includes forming a layer on a substrate disposed on the substrate support; measuring a thickness of the layer on the substrate; and calculating differences in thickness between a reference location on the substrate and a plurality of remaining locations on the substrate. The method further comprises computing spacing adjustment amounts for the remaining locations relative to the reference location based on the differences in thickness between the reference location and the remaining locations.