The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 06, 2010

Filed:

Aug. 14, 2007
Applicants:

Nian Yang, Mountain View, CA (US);

Yonggang Wu, Santa Clara, CA (US);

David Aoyagi, Santa Clara, CA (US);

Inventors:

Nian Yang, Mountain View, CA (US);

Yonggang Wu, Santa Clara, CA (US);

David Aoyagi, Santa Clara, CA (US);

Assignee:

Spansion LLC, Sunnyvale, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/8247 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method of forming a capacitor for use as a charge pump with flash memory, comprising: (a) concurrently forming polysilicon gates on a semiconductor body in a core region and a polysilicon middle capacitor plate in a peripheral region, (b) forming a first dielectric layer over the polysilicon gates and the middle capacitor plate, (c) planarizing the first dielectric layer to expose a top portion of the polysilicon gates and a top portion of the middle capacitor plate, (d) forming a second dielectric layer over the top portion of the middle capacitor layer, (e) concurrently forming patterning a second polysilicon layer in the core region and a third capacitor plate in the periphery region and (f) connecting the third capacitor plate to the source/drain well.


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