The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 29, 2010
Filed:
Jul. 05, 2007
Patrick Wong, Schilde, BE;
Wendy Fransisca Johanna Gehoel Van Ansem, Westerhoven, NL;
Rudolf Adrianus Joannes Maas, Eindhoven, NL;
Suping Wang, Veldhoven, NL;
Patrick Wong, Schilde, BE;
Wendy Fransisca Johanna Gehoel Van Ansem, Westerhoven, NL;
Rudolf Adrianus Joannes Maas, Eindhoven, NL;
Suping Wang, Veldhoven, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A substrate processing method of a substrate provided with an anti-reflective coating which extends to or beyond a peripheral edge of the substrate is disclosed. The method includes removing a portion of the anti-reflective coating adjacent to and around a periphery of the substrate using a back-side removal process, depositing a layer of radiation sensitive material onto the anti-reflective coating, depositing a top-coat layer onto the layer of radiation sensitive material, and simultaneously removing a portion of the layer of radiation sensitive material and a portion of the top-coat layer from around an area adjacent to the periphery of the substrate using a top-side removal process.