The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 22, 2010

Filed:

Jul. 17, 2008
Applicants:

Takahiro Dazai, Kawasaki, JP;

Hiroaki Shimizu, Kawasaki, JP;

Kyoko Ohshita, Kawasaki, JP;

Komei Hirahara, Kawasaki, JP;

Inventors:

Takahiro Dazai, Kawasaki, JP;

Hiroaki Shimizu, Kawasaki, JP;

Kyoko Ohshita, Kawasaki, JP;

Komei Hirahara, Kawasaki, JP;

Assignee:

Tokyo Ohka Kogyo Co., Ltd., Kawasaki-shi, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/039 (2006.01); G03F 7/20 (2006.01); G03F 7/30 (2006.01);
U.S. Cl.
CPC ...
Abstract

A positive resist composition including a resin component (A) which exhibits increased solubility in an alkali developing solution under action of acid and has a structural unit (a1) represented by general formula (a1-0-2) shown below, and an acid-generator component (B) which generates acid upon exposure and includes an acid generator (B1) consisting of a compound represented by general formula (b1-12) shown below: wherein R represents a hydrogen atom, a lower alkyl group or a halogenated lower alkyl group; Xrepresents an acid dissociable, dissolution inhibiting group; and Yrepresents an alkylene group or a divalent aliphatic cyclic group; andR—O—Y—SOA  (b1-12)wherein Rrepresents a monovalent aromatic organic group; Yrepresents an alkylene group of 1 to 4 carbon atoms which may be substituted with a fluorine atom; and Arepresents a cation.


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