The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 15, 2010

Filed:

Sep. 26, 2008
Applicant:

James P. Mcguire, Jr., Pasadena, CA (US);

Inventor:

James P. McGuire, Jr., Pasadena, CA (US);

Assignee:

ASML Netherlands B.V., Veldhoven, NL;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 5/30 (2006.01);
U.S. Cl.
CPC ...
Abstract

An optical imaging system for producing an optical image includes one or more powered optical elements with polarization aberration that degrade said optical image; and a polarization rotation system configured to reduce the contributions of the polarization aberration to the degradation of said optical image. The optical system may be used in a photolithography tool to pattern substrates such as semiconductor substrates and thereby produce semiconductor devices.


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