The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 15, 2010
Filed:
May. 23, 2005
Todd D. Hiar, Gilbert, AZ (US);
Theodore A. Paxton, Chandler, AZ (US);
Todd J. Davis, Gilbert, AZ (US);
Cassandra M. Owen, Chandler, AZ (US);
Todd D. Hiar, Gilbert, AZ (US);
Theodore A. Paxton, Chandler, AZ (US);
Todd J. Davis, Gilbert, AZ (US);
Cassandra M. Owen, Chandler, AZ (US);
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A method, computer program product, and apparatus configured to improve attribute uniformity of a substrate is disclosed. In an embodiment, the method involves calculating corrective data based on measured values of an attribute of a substrate processed by a lithographic exposure apparatus, the corrective data configured to at least partially correct non-uniformity of the values of the substrate attribute by controlling the temperature generated by a zone of a thermal plate used to heat or cool the substrate, and making the corrective data available to the thermal plate.