The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 08, 2010
Filed:
Nov. 24, 2004
Gang Zhang, Pittsburgh, PA (US);
Enis Aykut Dengi, Tempe, AZ (US);
Ronald A. Rohrer, Saratoga, CA (US);
Gang Zhang, Pittsburgh, PA (US);
Enis Aykut Dengi, Tempe, AZ (US);
Ronald A. Rohrer, Saratoga, CA (US);
Cadence Design Systems, Inc., San Jose, CA (US);
Abstract
Methods achieve fast parasitic closure in IC (integrated circuit) synthesis flow with particular application to RFIC (radio frequency integrated circuit) synthesis flow. Parasitic corners generated based on earlier layout statistics are incorporated into circuit resizing to enable parasitic robust designs. The worst-case parasitic corners are generated efficiently without expensive statistical computations. A performance-driven placement with simultaneous fast rough routing and device tuning generates high quality placements and compensates for layout induced performance degradations. A regression-tree based macromodeling methodology is introduced for modeling of electrical performances to enable true performance-driven layout synthesis. To improve sampling quality, an annealing-based placer can be used to perform sampling. The modeling methodology can be adapted to include automatically adjusting the device tuning ranges to meet certain model accuracy requirements.