The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 08, 2010
Filed:
Aug. 30, 2005
Applicants:
Toshimitsu Hirai, Chino, JP;
Toshihiro Ushiyama, Chino, JP;
Inventors:
Toshimitsu Hirai, Chino, JP;
Toshihiro Ushiyama, Chino, JP;
Assignee:
Seiko Epson Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/04 (2006.01);
U.S. Cl.
CPC ...
Abstract
A partition-wall structure having a concave portion corresponding to a pattern formed by a functional liquid, including: a first concave portion provided corresponding to a first pattern; a second concave portion provided corresponding to a second pattern that is coupled to the first pattern and whose width is smaller than a width of the first pattern; and a convex portion provided in the first pattern.
Hirai, Toshimitsu. (2010). Pattern formed structure, method of forming pattern, device, electrooptical device and electronic equipment (U.S. Patent No. 7732817). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7732817
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile