The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 01, 2010
Filed:
Nov. 10, 2005
Koji Kaneyama, Kyoto, JP;
Akihiro Hisai, Kyoto, JP;
Toru Asano, Kyoto, JP;
Hiroshi Kobayashi, Kyoto, JP;
Koji Kaneyama, Kyoto, JP;
Akihiro Hisai, Kyoto, JP;
Toru Asano, Kyoto, JP;
Hiroshi Kobayashi, Kyoto, JP;
Sokudo Co., Ltd., Kyoto, JP;
Abstract
A substrate processing apparatus comprises an indexer block, an anti-reflection film processing block, a resist film processing block, a development processing block, a resist cover film processing block, a resist cover film removal block, and an interface block. An exposure device is arranged adjacent to the interface block. A resist film is formed on a substrate in the resist film processing block. A resist cover film is formed on the resist film in the resist cover film processing block before the substrate is subjected to exposure processing by the exposure device.