The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 25, 2010
Filed:
Jan. 23, 2007
Je-bum Yoon, Hwaseong-si, KR;
Cha-won Koh, Yongin-si, KR;
Myoung-ho Jung, Suwon-si, KR;
Gi-sung Yeo, Seoul, KR;
Sang-jin Kim, Suwon-si, KR;
Je-bum Yoon, Hwaseong-si, KR;
Cha-won Koh, Yongin-si, KR;
Myoung-ho Jung, Suwon-si, KR;
Gi-sung Yeo, Seoul, KR;
Sang-jin Kim, Suwon-si, KR;
Samsung Electronics Co., Ltd., Gyeonggi-do, KR;
Abstract
Disclosed is an E-beam lithography system for synchronously irradiating surfaces of a plurality of substrates. The E-beam lithography system may include a loading unit loading and unloading substrates, an alignment chamber aligning the substrates, a transfer chamber transferring the substrates from the loading unit or chambers, a lithography chamber radiating one or more electron beams onto the substrates, and a vacuum chamber creating a vacuum in the chambers. A stage may be installed in the lithography chamber such that the substrates may be mounted on the stage and radiated with one or more electron beams.