The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 25, 2010
Filed:
Sep. 21, 2007
Alexander S. Perel, Danvers, MA (US);
Wilhelm Platow, Somerville, MA (US);
Craig Chaney, Rockport, MA (US);
Frank Sinclair, Quincy, MA (US);
Tyler Rockwell, Wakefield, MA (US);
Alexander S. Perel, Danvers, MA (US);
Wilhelm Platow, Somerville, MA (US);
Craig Chaney, Rockport, MA (US);
Frank Sinclair, Quincy, MA (US);
Tyler Rockwell, Wakefield, MA (US);
Varian Semiconductor Equipment Associates, Inc., Gloucester, MA (US);
Abstract
Techniques for providing optical ion beam metrology are disclosed. In one particular exemplary embodiment, the techniques may be realized as an apparatus for controlling beam density profile, the apparatus may include one or more camera systems to capture at least one image of an ion beam and a control system coupled to the one or more camera systems to control a beam density profile of the ion beam. The control system may further include a dose profiler to provide information to one or more ion implantation components in at least one of a feedback loop and a feedforward loop to improve dose and angle uniformity.