The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 25, 2010
Filed:
Jun. 27, 2007
Katsuyuki Moriya, Azumino, JP;
Toshimitsu Hirai, Chino, JP;
Katsuyuki Moriya, Azumino, JP;
Toshimitsu Hirai, Chino, JP;
Seiko Epson Corporation, , JP;
Abstract
A method for forming a pattern, comprises: forming a bank film on a substrate; performing a lyophobic treatment on a surface of the bank film; patterning the bank film on which the lyophobic treatment has been performed to form a bank; performing a surface modification treatment in which a hydroxyl group on a surface of a pattern forming region partitioned by the bank is alkylated; disposing a functional liquid in the pattern forming region; and firing the functional liquid to form a pattern.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile