The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 25, 2010
Filed:
Jan. 28, 2005
Toshiyuki Ogata, Kawasaki, JP;
Syogo Matsumaru, Kawasaki, JP;
Yohei Kinoshita, Kawasaki, JP;
Hideo Hada, Kawasaki, JP;
Daiju Shiono, Kawasaki, JP;
Hiroaki Shimizu, Kawasaki, JP;
Naotaka Kubota, Kawasaki, JP;
Toshiyuki Ogata, Kawasaki, JP;
Syogo Matsumaru, Kawasaki, JP;
Yohei Kinoshita, Kawasaki, JP;
Hideo Hada, Kawasaki, JP;
Daiju Shiono, Kawasaki, JP;
Hiroaki Shimizu, Kawasaki, JP;
Naotaka Kubota, Kawasaki, JP;
Tokyo Ohka Kogyo Co., Ltd., Kawasaki-shi, JP;
Abstract
The present invention provides a polymer compound which can constitute a photoresist composition which is capable of having an excellent resolution, forming a fine pattern with a good rectangularity, obtaining favorable resist characteristics even when acid strength of a acid generated from an acid generator is weak, and having favorable sensitivity; a photoresist composition including the polymer compound; and a resist pattern formation method using the photoresist composition. The photoresist composition and the resist pattern formation method use the polymer compound including an alkali soluble group (i), wherein the alkali soluble group (i) is at least one substituent group selected from an alcoholic hydroxyl group, a carboxyl group, or a phenolic hydroxyl group, and the substituent group is protected by an acid dissociable, dissolution inhibiting group (ii) represented by a general formula (1):—CH—OCHR  (1)