The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 18, 2010
Filed:
May. 28, 2008
Masaru Kurihara, Kawasaki, JP;
Masaru Izawa, Hino, JP;
Junichi Tanaka, Hachioji, JP;
Hitachi, Ltd., Tokyo, JP;
Abstract
A dimension measuring apparatus used for measuring a dimension of a semiconductor device having a first pattern of repeated structure and a second pattern that is linear and formed on the first pattern to extend over the repeated structure. The invention includes a shape information acquisition unit which acquires information on a shape of the first pattern; a width value acquisition unit which acquires a width value of each portion of the second pattern; an analytic area setting unit, which sets a plurality of analytic areas on the second pattern; and a dimension determining unit, which extracts, for each of the set analytic areas, width values of portions included in the analytic area, and uses the extracted width values to determine a dimension of the second pattern at portions overlapping the first pattern.