The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 18, 2010
Filed:
Feb. 06, 2008
William Ralph Knowles, Forest Grove, OR (US);
William Ralph Knowles, Forest Grove, OR (US);
FEI Company, Hillsboro, OR (US);
Abstract
A particle-optical apparatus, such as an ESEM®, for simultaneous observing a sample with particles and photons. A pressure limiting aperture (PLA) is placed in a diaphragm between the objective lens of the ESEM® and the sample position. The distance between the sample position and the aperture is sufficiently small to allow a large collection angle of the photons through this aperture. A mirror is placed between the diaphragm and the objective lens. Due to the large collection angle for photons a large NA is achieved. The small distance between sample position and aperture also result in less scattering of electrons than occurs in ESEM's where a mirror is placed between aperture and sample position, as the electrons have to travel through only a limited length in a high pressure area. Embodiments describe combinations where e.g. an immersion lens is used.