The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 18, 2010
Filed:
Feb. 24, 2006
Tomoko Suzuki, Tokyo, JP;
Toshitaka Hiraga, Kanagawa, JP;
Yasuo Katsuya, Kawasaki, JP;
Chris Reid, Glasgow, GB;
Tomoko Suzuki, Tokyo, JP;
Toshitaka Hiraga, Kanagawa, JP;
Yasuo Katsuya, Kawasaki, JP;
Chris Reid, Glasgow, GB;
EKC Technology, Inc., , CA (US);
Abstract
A variety of compositions that are particularly applicable for removing one or more of resist, etching residue, planarization residue, and copper oxide from a substrate comprising copper and a low-k dielectric material are described. The resist, residues, and copper oxide are removed by contacting the substrate surface with the composition, typically for a period of 30 seconds to 30 minutes, and at a temperature between 25° and 45° C. The composition includes a fluoride-providing component; at least 1% by weight of a water miscible organic solvent; an organic acid; and at least 81% by weight water. Typically the composition further includes up to about 0.4% of one or more chelators.