The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 7718519 B1

PDF
Full Text
Expired
Date of Patent:
May. 18, 2010

Filed:

Mar. 27, 2008
Applicants:

Kunimasa Takahashi, Hyogo, JP;

Chiaki Kudou, Hyogo, JP;

Inventors:

Kunimasa Takahashi, Hyogo, JP;

Chiaki Kudou, Hyogo, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/265 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method of producing a silicon carbide semiconductor device, including: step (A) of forming an impurity-doped region by implanting impurity ionsinto at least a portion of a silicon carbide layerformed on a first principal face of a silicon carbide substratehaving first and second principal faces; step (B) of forming capping layershaving thermal resistance on at least an upper faceof the silicon carbide layerand on at least a second principal faceof the silicon carbide substrate; and step (C) of performing an activation annealing treatment by heating the silicon carbide layerat a predetermined temperature.


Find Patent Forward Citations

Takahashi, Kunimasa. (2010). Method for manufacturing silicon carbide semiconductor element (U.S. Patent No. 7718519). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7718519

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Loading…