The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 18, 2010
Filed:
Aug. 17, 2005
Satheesh Kuppurao, San Jose, CA (US);
David K. Carlson, San Jose, CA (US);
Manish Hemkar, Sunnyvale, CA (US);
Andrew Lam, San Francisco, CA (US);
Errol Sanchez, Tracy, CA (US);
Howard Beckford, San Jose, CA (US);
Satheesh Kuppurao, San Jose, CA (US);
David K. Carlson, San Jose, CA (US);
Manish Hemkar, Sunnyvale, CA (US);
Andrew Lam, San Francisco, CA (US);
Errol Sanchez, Tracy, CA (US);
Howard Beckford, San Jose, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
Methods are disclosed for adjusting the temperature of at least a portion of the surface of a reaction chamber during a film formation process to control film properties. More than one portion of the chamber surface may be temperature-modulated, and may be accomplished by actively keeping the temperature of a first wall of the reaction chamber above the temperature of a second wall during the film formation process.