The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 18, 2010

Filed:

Jun. 19, 2007
Applicant:

Futoshi Shimai, Kanagawa, JP;

Inventor:

Futoshi Shimai, Kanagawa, JP;

Assignee:
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
B67D 1/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A treatment solution supply apparatus capable of reducing an initial overshooting amount and ensuring a stable dispense characteristic even when treating a large amount of substrates as recycling a developing solution for a large amount of substrates includes a flow meter having an integration function in the vicinity of a nozzle and carries out feedback to the pump revolution frequency control in response to a variation of the flow meter, so that a fixed amount of a solution may be regularly discharged irrespective of the clogging level of a filter. Also, a developing solution can be stably dispensed on a resist coated film within a solution applicable range from a minimum value (film thickness of 1 mm) to a maximum value (3 mm).


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