The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 11, 2010
Filed:
Dec. 28, 2005
Dong-keun Kim, Gyeonggi-do, KR;
Chung-ki Min, Gyeonggi-do, KR;
Yong-sun Ko, Gyeonggi-do, KR;
Kyung-hyun Kim, Seoul, KR;
Dong-Keun Kim, Gyeonggi-do, KR;
Chung-Ki Min, Gyeonggi-do, KR;
Yong-Sun Ko, Gyeonggi-do, KR;
Kyung-Hyun Kim, Seoul, KR;
Abstract
In an embodiment, a chemical mechanical polishing method for a substrate having a first layer and a stepped portion. A surface of the first layer is positioned above an upper face of the stepped portion. A polishing process for selectively removing the stepped portion is performed on the first layer by using a first slurry composition that has a self-stopping characteristic so that the first layer is changed into a second layer having a substantially flat surface. A second polishing process is performed using a second slurry composition that does not have the self-stopping characteristic, until the upper face of the stepped portion is exposed.