The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 11, 2010
Filed:
Jun. 13, 2007
Applicants:
Asao Yamashita, Fishkill, NY (US);
Merritt Funk, Austin, TX (US);
Daniel Prager, Hopewell Junction, NY (US);
Lee Chen, Cedar Creek, TX (US);
Radha Sundararajan, Dripping Springs, TX (US);
Inventors:
Asao Yamashita, Fishkill, NY (US);
Merritt Funk, Austin, TX (US);
Daniel Prager, Hopewell Junction, NY (US);
Lee Chen, Cedar Creek, TX (US);
Radha Sundararajan, Dripping Springs, TX (US);
Assignee:
Tokyo Electon Limited, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
The invention can provide a method of processing a substrate using Gate-Optimization processing sequences and evaluation libraries that can include gate-etch procedures, COR-etch procedures, and evaluation procedures.