The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 11, 2010
Filed:
Jul. 04, 2003
Ian Mayes, Bedfordshire, GB;
Michael Sweeney, Hemel Hempstead, GB;
Harvey Podgorney, Bedfordshire, GB;
Clive Meaton, Monmouthshire, GB;
Ian Mayes, Bedfordshire, GB;
Michael Sweeney, Hemel Hempstead, GB;
Harvey Podgorney, Bedfordshire, GB;
Clive Meaton, Monmouthshire, GB;
Nanometrics Incorporated, Milpitas, CA (US);
Abstract
An apparatus and method for improving the accuracy of Electrochemical Capacitance Voltage (ECV) profiling measurements by alerting the operator to the presence of surface films or gas bubbles during the etching process and by using this in-situ monitoring apparatus to determine the true measurement area at the end of the measurement cycle and using the new value to recalculate the data. By making the area measurement integral to the ECV tool, every sample measurement can be corrected for the true measurement area, leading to improved accuracy and eliminating a large source of error.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile