The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 04, 2010
Filed:
Oct. 25, 2007
Method and system for performing optical proximity correction with process variations considerations
Zhigang Pan, Austin, TX (US);
Peng Yu, Austin, TX (US);
Zhigang Pan, Austin, TX (US);
Peng Yu, Austin, TX (US);
The Board of Regents, University of Texas System, Austin, TX (US);
Abstract
A method for performing optical proximity correction with process variations considerations is disclosed. The maximum aerial gradient direction for a control point associated with an edge is initially determined. Then, a variational edge placement errorE along the maximum aerial image intensity gradient direction of the control point is calculated. A determination is made whether or not |CE·n| is equal to or greater than a manufacturing grid, where n is the direction perpendicular to a segment pointing outward, and C is a constant. If |CE·n| is equal to or greater than a manufacturing grid, the edge is moved by −CE·n.