The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 04, 2010
Filed:
Jun. 17, 2005
Carlo Waldfried, Falls Church, VA (US);
Christopher Garmer, Rockville, MD (US);
Orlando Escorcia, Falls Church, VA (US);
Ivan Berry, Iii, Ellicott City, MD (US);
Palani Sakthivel, Odenton, MD (US);
Alan C. Janos, Darnestown, MD (US);
Carlo Waldfried, Falls Church, VA (US);
Christopher Garmer, Rockville, MD (US);
Orlando Escorcia, Falls Church, VA (US);
Ivan Berry, III, Ellicott City, MD (US);
Palani Sakthivel, Odenton, MD (US);
Alan C. Janos, Darnestown, MD (US);
Axcelis Technologies, Inc., Beverly, MA (US);
Abstract
Apparatuses and processes for treating dielectric materials such as low k dielectric materials, premetal dielectric materials, barrier layers, and the like, generally comprise a radiation source module, a process chamber module coupled to the radiation source module; and a loadlock chamber module in operative communication with the process chamber and a wafer handler. The atmosphere of each one of the modules can be controlled as may be desired for different types of dielectric materials. The radiation source module includes a reflector, an ultraviolet radiation source, and a plate transmissive to the wavelengths of about 150 nm to about 300 nm, to define a sealed interior region, wherein the sealed interior region is in fluid communication with a fluid source.