The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 27, 2010
Filed:
Feb. 06, 2004
Takashi Yoneyama, Sagamihara, JP;
Eriko Tsuji, Machida, JP;
Takashi Yoneyama, Sagamihara, JP;
Eriko Tsuji, Machida, JP;
Olympus Corporation, Tokyo, JP;
Abstract
A defect inspection apparatus which includes a pattern image obtaining unit obtaining a pattern image of a predetermined part by causing focusing control to be performed in order to achieve focus on the predetermined part within an observation object according to set focusing control parameters, a pattern image storing unit storing the pattern image, and a detecting unit detecting the presence/absence of an abnormal condition of a part to be inspected by making a comparison between the pattern image of a reference part within the observation object, and the pattern image of the part to be inspected within the observation object. The focusing control parameters, set when the pattern image of the part to be inspected is obtained, are determined based on sample information obtained when the pattern image of the reference part is obtained.