The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 20, 2010
Filed:
Mar. 17, 2008
Makoto Ezumi, Mito, JP;
Yoichi Ose, Mito, JP;
Akira Ikegami, Mito, JP;
Hideo Todokoro, Hinode, JP;
Tatsuaki Ishijima, Hitachinaka, JP;
Takahiro Sato, Hitachinaka, JP;
Ritsuo Fukaya, Hitachinaka, JP;
Kazunari Asao, Hitachinaka, JP;
Makoto Ezumi, Mito, JP;
Yoichi Ose, Mito, JP;
Akira Ikegami, Mito, JP;
Hideo Todokoro, Hinode, JP;
Tatsuaki Ishijima, Hitachinaka, JP;
Takahiro Sato, Hitachinaka, JP;
Ritsuo Fukaya, Hitachinaka, JP;
Kazunari Asao, Hitachinaka, JP;
Hitachi, Ltd., Tokyo, JP;
Abstract
The present invention has the object of providing a charged particle beam irradiation method ideal for reducing the focus offset, magnification fluctuation and measurement length error in charged particle beam devices. To achieve these objects, a method is disclosed in the invention for measuring the electrical potential distribution on the sample with a static electrometer while loaded by a loader mechanism. Another method is disclosed for measuring the local electrical charge at specified points on the sample, and isolating and measuring the wide area electrostatic charge quantity from those local electrostatic charges. Yet another method is disclosed for correcting the measurement length value or magnification based on fluctuations found by measuring the amount of electrostatic charge at the specified points under at least two charged particle optical conditions, and then using a charged particle beam to measure fluctuations in measurement dimensions occurring due to fluctuations in the electrostatic charge at the specified locations.