The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 20, 2010
Filed:
Mar. 31, 2006
Applicants:
Takeshi Shimada, Osaka, JP;
Koichi Terao, Osaka, JP;
Kazuya Toji, Osaka, JP;
Inventors:
Assignee:
Hitachi Metals, Ltd., Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C04B 35/00 (2006.01); C01F 17/00 (2006.01); C01D 15/02 (2006.01); C01B 13/14 (2006.01); C04B 35/46 (2006.01); H01B 1/08 (2006.01);
U.S. Cl.
CPC ...
Abstract
A method of producing a semiconductor disk represented by a composition formula [(BiNa)(BaR)]TiO, in which R is at least one element of La, Dy, Eu, Gd and Y and x and y each satisfy 0≦x≦0.14, and 0.002≦y≦0.02 includes carrying out a sintering in an inert gas atmosphere with an oxygen concentration of 9 ppm to 1% and wherein a treatment at an elevated temperature in an oxidizing atmosphere after the sintering is not carried out.