The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 20, 2010

Filed:

Dec. 21, 2007
Applicants:

Kyoung Bong Rouh, Goyang-si, KR;

Seung Woo Jin, Icheon-si, KR;

Min Yong Lee, Seoul, KR;

Inventors:

Kyoung Bong Rouh, Goyang-si, KR;

Seung Woo Jin, Icheon-si, KR;

Min Yong Lee, Seoul, KR;

Assignee:

Hynix Semiconductor Inc., Icheon-si, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/336 (2006.01);
U.S. Cl.
CPC ...
Abstract

A semiconductor device, having a recessed gate and asymmetric dopant regions, comprises a semiconductor substrate having a trench with a first sidewall and a second sidewall, the heights of which are different from each other, a gate insulating layer pattern disposed on the semiconductor substrate, a gate stack disposed on the semiconductor such that the gate stack protrudes from the surface of the semiconductor substrate while the gate stack fills the trench, and first and second dopant regions disposed at the upper part of the semiconductor substrate adjacent to the first and second sidewalls of the trench, respectively, such that the first and second dopant regions have different steps.


Find Patent Forward Citations

Loading…