The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 20, 2010

Filed:

Oct. 31, 2006
Applicants:

Daniel O. Clark, Pleasanton, CA (US);

Sebastien Raoux, Santa Clara, CA (US);

Robert M. Vermeulen, Pleasant Hill, CA (US);

Shaun W. Crawford, San Ramon, CA (US);

Inventors:

Daniel O. Clark, Pleasanton, CA (US);

Sebastien Raoux, Santa Clara, CA (US);

Robert M. Vermeulen, Pleasant Hill, CA (US);

Shaun W. Crawford, San Ramon, CA (US);

Assignee:

Applied Materials, Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B01D 50/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

In certain embodiments, an apparatus is provided for use in removing pollutants from a gas stream. The apparatus includes a thermal reaction unit formed from a plurality of stacked porous ceramic rings. At least one of the stacked ceramic sections may be adapted to allow sensing of a characteristic of contents of the central chamber. In some embodiments, waste gas inlets to the thermal reaction unit may be angled to create a helical vortex within the thermal reaction unit. Other aspects are provided.


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