The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 13, 2010
Filed:
Dec. 11, 2006
Marcel Mathijs Theodore Marie Dierichs, Venlo, NL;
Hans Van Der Laan, Veldhoven, NL;
Hendrikus Robertus Marie Van Greevenbroek, Eindhoven, NL;
Marcel Mathijs Theodore Marie Dierichs, Venlo, NL;
Hans Van Der Laan, Veldhoven, NL;
Hendrikus Robertus Marie Van Greevenbroek, Eindhoven, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A lithographic apparatus includes a device having a blade selectively insertable into the beam. The device is in a first plane intermediate a second plane conjugate to a plane of the substrate and a third plane conjugate to a pupil plane of the projection system. The blade may include a partially opaque blade and a solid blade or have a predetermined transmissibility pattern. The transmissibility may vary in a second direction perpendicular to the first direction in which the substrate and the patterning device are movable. In an illumination system including a field faceted mirror and a pupil faceted mirror, a reflecting blade is selectively insertable into the beam to reflect a portion of the beam to a beam dump that may be cooled to reduce a heat load. The reflecting element may have a coating that scatters the portion of radiation or changes the phase.